Ecology and Environment ›› 2024, Vol. 33 ›› Issue (1): 144-155.DOI: 10.16258/j.cnki.1674-5906.2024.01.015
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LI Danyi1,2(), HUANG Xianting1,3, LI Jichao4, LI Yingjie1,3, YAN Jiapu1, LIN Wei1,*(
)
Received:
2023-09-26
Online:
2024-01-18
Published:
2024-03-19
Contact:
LIN Wei
李丹怡1,2(), 黄显婷1,3, 李继超4, 李颖洁1,3, 闫家普1, 林慰1,*(
)
通讯作者:
林慰
作者简介:
李丹怡(1994年生),女,硕士,主要从事水污染控制技术、渔业环境与水产品风险评估等研究。E-mial: lidy27@mail2.sysu.edu.cn
基金资助:
CLC Number:
LI Danyi, HUANG Xianting, LI Jichao, LI Yingjie, YAN Jiapu, LIN Wei. Advances in the Removal of Antibiotics from Water by Graphene Oxide and Its Composites[J]. Ecology and Environment, 2024, 33(1): 144-155.
李丹怡, 黄显婷, 李继超, 李颖洁, 闫家普, 林慰. 氧化石墨烯及其复合材料去除水体抗生素的研究进展[J]. 生态环境学报, 2024, 33(1): 144-155.
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URL: https://www.jeesci.com/EN/10.16258/j.cnki.1674-5906.2024.01.015
原料 | 反应时间 | 缺点 | 参考文献 |
---|---|---|---|
石墨、浓HNO3、KClO3/ KClO4/NaClO4 | 3−4 d | 生成有害气体、易爆炸 | Brodie, |
石墨、浓HNO3、KClO3、浓H2SO4 | 96 h | 生成有害气体、氧化程度过低、易破坏碳结构 | Staudenmaier, |
石墨、NaNO3、KMnO4、浓H2SO4、H2O2 | <2 h | 结构影响因素多 | Hummers et al., |
石墨、H2SO4、 H3PO4、KMnO4 | 12 h | 成本高 | Marcano et al., |
石墨、KMnO4、H2O2 | 1 h | 稳定性低 | Chao et al., |
Table 1 Preparation methods of GO
原料 | 反应时间 | 缺点 | 参考文献 |
---|---|---|---|
石墨、浓HNO3、KClO3/ KClO4/NaClO4 | 3−4 d | 生成有害气体、易爆炸 | Brodie, |
石墨、浓HNO3、KClO3、浓H2SO4 | 96 h | 生成有害气体、氧化程度过低、易破坏碳结构 | Staudenmaier, |
石墨、NaNO3、KMnO4、浓H2SO4、H2O2 | <2 h | 结构影响因素多 | Hummers et al., |
石墨、H2SO4、 H3PO4、KMnO4 | 12 h | 成本高 | Marcano et al., |
石墨、KMnO4、H2O2 | 1 h | 稳定性低 | Chao et al., |
分类 | 思路 | 原理 | 制备方法 |
---|---|---|---|
石墨烯量子点 | 自上而下 | 通过物理或化学方法将大尺寸的石墨烯薄片切割成小尺寸的石墨烯量子点 | 水热法、电化学法、 化学剥离碳纤维法 |
自下而上 | 以小分子作前体通过一系列化学反应制备石墨烯量子点 | 溶液化学法、超声波法和微波法、 可控热解多环芳烃法 | |
特殊方法 | 将富勒烯在活泼过渡金属钌催化作用下分解获得系列原子级别的石墨烯量子点 | 电子束刻蚀法、钌催化C60转化法 | |
共价键修饰氧化石墨烯材料 | 共价键 修饰 | 有机小分子和聚合物负载到石墨烯或氧化石墨烯表面 | 原位聚合法、溶液共混法、熔融共混法、乳液共混法、Pickering乳液聚合法 |
无机纳米氧化石墨烯材料 | 物理掺杂 | 金属/金属氧化物与氧化石墨烯复合 | 水热法、高功率超声法、热剥离法 |
化学复合 | 以氯化亚锡和氧化石墨为原料制备得到二氧化锡/石墨烯复合材料 | 气热法、原位合成法 |
Table 2 Classification and preparation methods of typical GO composites
分类 | 思路 | 原理 | 制备方法 |
---|---|---|---|
石墨烯量子点 | 自上而下 | 通过物理或化学方法将大尺寸的石墨烯薄片切割成小尺寸的石墨烯量子点 | 水热法、电化学法、 化学剥离碳纤维法 |
自下而上 | 以小分子作前体通过一系列化学反应制备石墨烯量子点 | 溶液化学法、超声波法和微波法、 可控热解多环芳烃法 | |
特殊方法 | 将富勒烯在活泼过渡金属钌催化作用下分解获得系列原子级别的石墨烯量子点 | 电子束刻蚀法、钌催化C60转化法 | |
共价键修饰氧化石墨烯材料 | 共价键 修饰 | 有机小分子和聚合物负载到石墨烯或氧化石墨烯表面 | 原位聚合法、溶液共混法、熔融共混法、乳液共混法、Pickering乳液聚合法 |
无机纳米氧化石墨烯材料 | 物理掺杂 | 金属/金属氧化物与氧化石墨烯复合 | 水热法、高功率超声法、热剥离法 |
化学复合 | 以氯化亚锡和氧化石墨为原料制备得到二氧化锡/石墨烯复合材料 | 气热法、原位合成法 |
抗生素 | 吸附材料 | 吸附率 (吸附容量) | 反应条件 | 去除机理 | 参考文献 |
---|---|---|---|---|---|
左氧氟沙星 | 天冬氨酸-功能化氧化石墨烯-氧化锌 (GO-ZnO) | 95.12% (73.15 mg·g−1) | pH=7; t=25 ℃; 投加量为0.6 g·L−1; 初始质量浓度为30 mg·L−1 | 静电相互作用、 氢键、π-π相互作用 | Ismail et al., |
磺胺 | 锰原子-氮掺杂氧化石墨烯 (Mn-NGO) | 98.7% | pH为微酸性或中性; t =25 ℃; 投加量为1 g·L−1; 初始质量浓度为10 mg·L−1 | 阳离子-π键、静电吸引、 光催化降解 (羟基自由基、超氧自由基等) | Lü et al., |
土霉素 恶喹酸 甲氧苄啶 | 柠檬酸改性氧化石墨烯- 羧甲基纤维素膜 (GO-CMC) | OTC: 33.8% (102.05 mg·g−1) OA: 97.2% (256.68 mg·g−1) TMP: 83.3% (370.93 mg·g−1) | pH=5(OTC)/7(OA)/8(TMP); t=30 ℃; 投加量为1 g·L−1; 初始质量浓度为100 mg·L−1 | 阳离子-π键、 π-π相互作用 | Juengchareo-npoon et al., |
四环素 | 磁性氧化石墨烯海绵 (MGOS) | 85% (473 mg·g−1) | pH=10; t =35 ℃; 投加量为0.6 g·L−1; 初始质量浓度为400 mg·L−1 | 静电相互作用、 阳离子-π键 | Yu et al., |
四环素 | 磁性氧化石墨烯/氧化钨 (GO/W18O49) | >79% (318.18 mg·g−1) | pH=5; t=40 ℃; 初始质量浓度为100 mg·L−1 | π-π相互作用、静电吸引、络合作用、阳离子交换、氢键 | Qiao et al., |
环丙沙星 | 氧化石墨烯/海藻酸钙-聚丙烯酰胺 (GO/Ca-Alg2-PAM) | 6.846 mg·g−1 | t=25 ℃; 投加量为0.9 g·L−1 | ‒ | Choi et al., |
环丙沙星 | 几丁质/氧化石墨烯纳米材料 (nGO) | (282±11) mg·g−1 | pH=6.3; t =25 ℃; 投加量为5 g·L−1 | π-π堆积、静电吸引、 孔隙作用 | González et al., |
环丙沙星 诺氟沙星 | 氧化镁/壳聚糖/氧化石墨烯(MgO/Chit/GO) | CIP: 1111 mg·g−1 NOR: 1000 mg·g−1 | pH=7; t =25 ℃; 投加量为0.5 g·L−1 | π-π相互作用、 静电相互作用 | Nazraz et al., |
Table 3 Applications of adsorptive removal of antibiotics by GO composites
抗生素 | 吸附材料 | 吸附率 (吸附容量) | 反应条件 | 去除机理 | 参考文献 |
---|---|---|---|---|---|
左氧氟沙星 | 天冬氨酸-功能化氧化石墨烯-氧化锌 (GO-ZnO) | 95.12% (73.15 mg·g−1) | pH=7; t=25 ℃; 投加量为0.6 g·L−1; 初始质量浓度为30 mg·L−1 | 静电相互作用、 氢键、π-π相互作用 | Ismail et al., |
磺胺 | 锰原子-氮掺杂氧化石墨烯 (Mn-NGO) | 98.7% | pH为微酸性或中性; t =25 ℃; 投加量为1 g·L−1; 初始质量浓度为10 mg·L−1 | 阳离子-π键、静电吸引、 光催化降解 (羟基自由基、超氧自由基等) | Lü et al., |
土霉素 恶喹酸 甲氧苄啶 | 柠檬酸改性氧化石墨烯- 羧甲基纤维素膜 (GO-CMC) | OTC: 33.8% (102.05 mg·g−1) OA: 97.2% (256.68 mg·g−1) TMP: 83.3% (370.93 mg·g−1) | pH=5(OTC)/7(OA)/8(TMP); t=30 ℃; 投加量为1 g·L−1; 初始质量浓度为100 mg·L−1 | 阳离子-π键、 π-π相互作用 | Juengchareo-npoon et al., |
四环素 | 磁性氧化石墨烯海绵 (MGOS) | 85% (473 mg·g−1) | pH=10; t =35 ℃; 投加量为0.6 g·L−1; 初始质量浓度为400 mg·L−1 | 静电相互作用、 阳离子-π键 | Yu et al., |
四环素 | 磁性氧化石墨烯/氧化钨 (GO/W18O49) | >79% (318.18 mg·g−1) | pH=5; t=40 ℃; 初始质量浓度为100 mg·L−1 | π-π相互作用、静电吸引、络合作用、阳离子交换、氢键 | Qiao et al., |
环丙沙星 | 氧化石墨烯/海藻酸钙-聚丙烯酰胺 (GO/Ca-Alg2-PAM) | 6.846 mg·g−1 | t=25 ℃; 投加量为0.9 g·L−1 | ‒ | Choi et al., |
环丙沙星 | 几丁质/氧化石墨烯纳米材料 (nGO) | (282±11) mg·g−1 | pH=6.3; t =25 ℃; 投加量为5 g·L−1 | π-π堆积、静电吸引、 孔隙作用 | González et al., |
环丙沙星 诺氟沙星 | 氧化镁/壳聚糖/氧化石墨烯(MgO/Chit/GO) | CIP: 1111 mg·g−1 NOR: 1000 mg·g−1 | pH=7; t =25 ℃; 投加量为0.5 g·L−1 | π-π相互作用、 静电相互作用 | Nazraz et al., |
抗生素 | 光催化剂 | 去除效率 | 反应条件 | 关键活性物质 | 参考文献 |
---|---|---|---|---|---|
诺氟沙星 | 四氧二铁酸钴-还原氧化石墨烯-溴化氧铋 (CoFe2O4-rGO-BiOBr) | 88.7% | t=20 ℃; 投加量为0.3 g·L−1; 初始质量浓度为5 mg·L−1 | 光生空穴、 羟基自由基 | Zhang et al., |
四环素 金霉素 土霉素 强力霉素 | 钒酸铋/二氧化钛/还原氧化石墨烯(BiVO4/TiO2/rGO) | TC: 96.2% CTC: 97.5% OTC: 98.7% DXC: 99.6% | λ>420 nm; 初始质量浓度为10 mg·L−1 | 羟基自由基、 超氧自由基 | Wang et al., |
头孢氨苄 | 氨基化二氧化锰/氧化石墨烯/臭氧化和质子功能化石墨相氮化碳(MnO2-NH2/GO/p-C3N4) | 100% | 初始质量浓度为1 mg·L−1 | 光生空穴、羟基自由基、超氧自由基 | Yang et al., |
甲氧苄啶 | 铜铁层状双氢氧化物涂层/氧化石墨烯 (CuFe-LDH/GO) | 90.8% | t=(25±2) ℃; λ=254 nm; pH=8.8; 投加量为0.25 g·L−1; 初始质量浓度为20 mg·L−1 | 硫酸根自由基、 光生电子 | Vasseghian et al., |
土霉素 | 溴氧化铋/二硫化钼/氧化石墨烯异质结(BiOBr/MoS2/GO) | >98% | 室温; λ=380 nm; 投加量为1 g·L−1; 初始质量浓度为10 mg·L−1 | 光生空穴、羟基自由基、超氧自由基 | Li et al., |
头孢克洛 | 伊红Y/氧化石墨烯(GO/EY) | 97% | pH=7; 投加量为0.1 g·L−1; 初始质量浓度为2 mg·L−1 | 单态氧、 过氧化氢 | Luo et al., |
Table 4 Applications of photocatalytic antibiotics degradation by GO composites
抗生素 | 光催化剂 | 去除效率 | 反应条件 | 关键活性物质 | 参考文献 |
---|---|---|---|---|---|
诺氟沙星 | 四氧二铁酸钴-还原氧化石墨烯-溴化氧铋 (CoFe2O4-rGO-BiOBr) | 88.7% | t=20 ℃; 投加量为0.3 g·L−1; 初始质量浓度为5 mg·L−1 | 光生空穴、 羟基自由基 | Zhang et al., |
四环素 金霉素 土霉素 强力霉素 | 钒酸铋/二氧化钛/还原氧化石墨烯(BiVO4/TiO2/rGO) | TC: 96.2% CTC: 97.5% OTC: 98.7% DXC: 99.6% | λ>420 nm; 初始质量浓度为10 mg·L−1 | 羟基自由基、 超氧自由基 | Wang et al., |
头孢氨苄 | 氨基化二氧化锰/氧化石墨烯/臭氧化和质子功能化石墨相氮化碳(MnO2-NH2/GO/p-C3N4) | 100% | 初始质量浓度为1 mg·L−1 | 光生空穴、羟基自由基、超氧自由基 | Yang et al., |
甲氧苄啶 | 铜铁层状双氢氧化物涂层/氧化石墨烯 (CuFe-LDH/GO) | 90.8% | t=(25±2) ℃; λ=254 nm; pH=8.8; 投加量为0.25 g·L−1; 初始质量浓度为20 mg·L−1 | 硫酸根自由基、 光生电子 | Vasseghian et al., |
土霉素 | 溴氧化铋/二硫化钼/氧化石墨烯异质结(BiOBr/MoS2/GO) | >98% | 室温; λ=380 nm; 投加量为1 g·L−1; 初始质量浓度为10 mg·L−1 | 光生空穴、羟基自由基、超氧自由基 | Li et al., |
头孢克洛 | 伊红Y/氧化石墨烯(GO/EY) | 97% | pH=7; 投加量为0.1 g·L−1; 初始质量浓度为2 mg·L−1 | 单态氧、 过氧化氢 | Luo et al., |
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