生态环境学报 ›› 2024, Vol. 33 ›› Issue (5): 781-790.DOI: 10.16258/j.cnki.1674-5906.2024.05.011

• 研究论文【环境科学】 • 上一篇    下一篇

施硅水平对水稻根表铁膜和体内Cd累积分布的影响

李林峰1,2,3(), 徐梓盛1,2,3, 陈勇1,2,3, 李奇1,2,3, 林晓扬1,2,3, 李义纯1,2,3,*()   

  1. 1.广东省农业科学院农业资源与环境研究所,广东 广州 510640
    2.农业部南方植物营养与肥料重点实验室,广东 广州 510640
    3.广东省养分资源循环利用与耕地保育重点实验室,广东 广州 510640
  • 收稿日期:2024-02-06 出版日期:2024-05-18 发布日期:2024-06-27
  • 通讯作者: * 李义纯。E-mail: yichunli@gdaas.cn
  • 作者简介:李林峰(1986年生),男,副研究员,博士,研究方向为农田重金属污染防治。E-mail: lilinfeng@gdaas.cn
  • 基金资助:
    广东省自然科学基金项目(2020A1515011190);广东农业科技创新及推广项目(2023KJ118)

The Impact of Silicon Application Levels on the Iron Plaque of Rice Roots and the Accumulation and Distribution of Cadmium Within the Plant

LI Linfeng1,2,3(), XU Zisheng1,2,3, CHEN Yong1,2,3, LI Qi1,2,3, LIN Xiaoyang1,2,3, LI Yichun1,2,3,*()   

  1. 1. Institute of Agricultural Resources and Environment, Guangdong Academy of Agricultural Sciences, Guangzhou 510640, P. R. China
    2. Key Laboratory of Plant Nutrition and Fertilizer in South Region, Ministry of Agriculture, Guangzhou 510640, P. R. China
    3. Guangdong Key Laboratory of Nutrient Cycling and Farmland Conservation, Guangzhou 510640, P. R. China
  • Received:2024-02-06 Online:2024-05-18 Published:2024-06-27

摘要:

稻田镉(Cd)污染治理是中国当前亟需解决的重大科学问题;根表铁膜是水稻根系吸收Cd的重要屏障,施硅(Si)调控水稻根系抗氧化酶和乙烯合成酶活性影响根表铁膜对Cd的吸附,并改变水稻体内Cd的累积和分布,但不同施Si水平对水稻根表铁膜和体内Cd累积分布的影响尚未完全清楚。采用水稻盆栽试验,探讨高、低两种施Si水平条件下,水稻成熟期不同组织器官中Cd的含量、分布规律和水稻体内Cd的转运能力,以及抽穗期根表铁膜的Cd含量、形貌特征与根系抗氧化酶和乙烯合成酶基因的表达,试图揭示不同施Si水平对水稻根表铁膜Cd吸附和体内Cd累积分布的影响。结果表明,施Si会减少成熟期水稻茎中Cd的含量,增大根系中Cd的分布比例,而高Si水平(0.66 g∙kg−1)还会进一步降低茎节和糙米中Cd的含量和分布比例,抑制根系转运Cd至糙米的能力。此外,施Si可以增强抽穗期水稻根系超氧化物歧化酶基因(OsSOD-Cu/ZnOsSOD-Fe)、过氧化氢酶基因(OsCATaOsCATb)以及乙烯合成酶基因(OsACS1)的表达,高Si水平(0.66 g∙kg−1)能够显著增加根表铁膜中的DCB-Fe和DCB-Cd含量,增大根表铁膜的表面粗糙度,并且进一步增强根系OsSOD-FeOsACS1的表达。研究结果证实施Si水平是影响水稻根表铁膜和体内Cd累积分布的关键因素,高水平Si能够更显著地促进水稻根系抗氧化酶基因的表达,增强铁膜形成及其对Cd的吸附,并且抑制根系Cd向糙米的转运和茎节中Cd的分布,从而降低糙米中Cd的累积。该研究成果可为解决中国稻田Cd污染治理难题提供理论依据。

关键词: 水稻, 施硅水平, 镉, 铁膜, 累积分布, 基因表达

Abstract:

The management of cadmium (Cd) pollution in rice fields is a pressing scientific issue that needs to be addressed in China. The iron plaque on the root surface serves as a crucial barrier for Cd absorption by rice roots. The application of silicon (Si) has been found to regulate the activity of antioxidant and ethylene synthase enzymes in rice roots, affecting the adsorption of Cd by the root iron plaque and altering the accumulation and distribution of Cd within the rice plant. However, the effects of different Si application levels on the iron plaque of rice roots and the accumulation and distribution of Cd within the plant are not yet fully understood. A pot experiment with rice was conducted to explore the content and distribution pattern of Cd in different tissues and organs at the mature stage of rice under high and low Si application levels, as well as the Cd transport capacity within the rice plant. The content of Cd in the iron plaque on the root surface, the morphological characteristics, and the expression of genes related to antioxidant enzymes and ethylene synthase during the heading stage were also investigated, aiming to reveal the impact of different Si levels on the adsorption of Cd by the root iron plaque and the accumulation and distribution of Cd within the plant. The results indicated that Si application reduced the Cd content in the stems at maturity, increased the distribution ratio of Cd in the roots, and at a high Si level (0.66 g∙kg-1), further decreased the Cd content and distribution ratio in the stem nodes and brown rice, inhibiting the ability of the roots to transport Cd to the brown rice. Additionally, Si application was shown to enhance the expression of genes for superoxide dismutase (OsSOD-Cu/Zn and OsSOD-Fe), catalase (OsCATa and OsCATb), and ethylene synthase (OsACS1) during the heading stage. A high level of Si (0.66 g∙kg−1) significantly increased the content of DCB-Fe and DCB-Cd in the root iron plaque, increased the surface roughness of the iron plaque, and further enhanced the expression of OsSOD-Fe and OsACS1 in the roots. The study confirmed that the level of Si application is a key factor affecting the iron plaque on rice roots and the accumulation and distribution of Cd within the plant. A high level of Si application more significantly promoted the expression of antioxidant enzyme genes in the rice roots, enhanced the formation of the iron plaque and its adsorption of Cd, and inhibited the transport of Cd from the roots to the brown rice and the distribution of Cd in the stem nodes, thereby reducing the accumulation of Cd in the brown rice. These findings provide a theoretical basis for addressing the challenge of Cd pollution management in rice fields in China.

Key words: rice, silicon application levels, cadmium, iron plaque, accumulation and distribution, gene expression

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